Non-Destructive Testing Using Infrared Birfringence
Abstract
In this work, the technique of infrared piezo birefringence is investigated for characterization of defects in semiconductor materials. As a first step towards simulating defect images, the cases of diametrically loaded discs of Si and GaAs were examined. Simulated images were generated by a computer and were compared with the experimentally obtained ones subjected to the same conditions. The results showed an excellent match between the two cases. The behavior of the stress-optic coefficient C was also investigated in this work. The value of C has been taken to be a constant in earlier works by other investigators. Keywords: Infrared birefringence, Defect simulation, Semiconductor materials, Non destructive characterization, Silicon, Gallium arsenides.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 20, 1988
- Accession Number
- ADA198141
Entities
People
- Aloke K. Dutta
- Burke Huner
- Pratul K. Ajmera
Organizations
- Louisiana State University