Radiation Sensitivity of Soluble Polysilane Derivatives: Science and Applications
Abstract
Polysilane derivatives have very unusual electronic properties associated with extensive sigma delocalization along the polymer backbone. Strong electronic transitions which depend on the nature of the substituents, the polymer molecular weight and the conformation of the backbone appear in the UV. These materials are radiation sensitive and are degraded to lower molecular weight fragments upon exposure to light and ionizing radiation. This review attempts to overview the nature of these radiation induced processes and describes some potential applications primarily in the field of microlithography. Keywords: High molecular weight polysilanes; Radiation sensitivity.
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 01, 1988
- Accession Number
- ADA198805
Entities
People
- R. D. Miller
Organizations
- International Business Machines Corporation (Armonk, NY)