A New Mechanism for Hydrogen Desorption from Covalent Surfaces: The Monohydride Phase on Si(100)

Abstract

A new mechanism for the thermal desorption of molecular hydrogen from the monohydride phase on Si(100) has been identified. The unusual first-order desorption kinetics that are observed are due to the irreversible excitation of a hydrogen adatom into a delocalized, two-dimensional band state on the surface with an activation energy of 47 kcal/mol. The desorption reaction occurs between this excited hydrogen adatom and a second, localized hydrogen adatom. The mechanism was verified by adsorption of atomic hydrogen into the band state and the observation of reaction with localized deuterium adatoms at a temperature below that at which desorption from the surface normally occurs. Keywords: Silicon, Hydrogen, Atomic hydrogen, Silicon monohydride, Laser induced thermal desorption, Covalent solid surface, Thermal desorption.

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Document Details

Document Type
Technical Report
Publication Date
Aug 12, 1988
Accession Number
ADA198842

Entities

People

  • John Yates
  • K. C. Janda
  • Kumar Sinniah
  • Lisa B. Lewis
  • Michael G. Sherman
  • W. H. Weinberg

Organizations

  • University of Pittsburgh

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Auger Electron Spectroscopy
  • Auger Electrons
  • Chemical Engineering
  • Chemistry
  • Desorption
  • Deuterium
  • Electron Spectroscopy
  • Heat Of Activation
  • Mass Spectrometry
  • Measurement
  • Military Research
  • Spectra
  • Spectrometry
  • Spectroscopy
  • Surface Temperature
  • Two Dimensional
  • United States

Readers

  • Combustion science or combustion engineering.
  • Quantum Chemistry
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy