Diamond Films by Ion Beam Deposition
Abstract
Diamond-like films potentially valuable as X-ray lithography masks were fabricated by high rate ion beam deposition using a non-mass analyzed ion source. The high deposition rate reduced the percent of impurities found in the film under normal high vacuum conditions, and left a very hard, continuous and uniform surface. The crystal structure of the film could not be ascertained but it was not epitaxial with the structure of the silicon substrate. Mass analyzed ion beam deposition was the original experiment intended for this research. Very careful design of a deceleration lens to ensure correct energy of ions decelerated from 35 keV to 100 eV was successfully implemented. Non-mass analyzed ion beam deposition can be commercialized with reasonable throughput and final coat of the proposed product. This technology could provide superior masks for the next generation of photolithography of submicron features.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 01, 1988
- Accession Number
- ADA199818
Entities
People
- Anton C. Greenwald
- James K. Hirvonen