The Effect of Energetic Charged Particle Bombardment on the Properties of Thin Films of High Tc Superconductors

Abstract

The effects of low fluence ( < 10 to the 14th power/sq cm) 63 MeV H(+) and 65 MeV He2(+) irradiation of prototype thin films of YBa2Cu3O(7 - delta) produced by a plasma arc spray technique. The observed change in the resistance versus temperature behavior is much more dramatic than that observed for films produced by other techniques and resembles qualitatively a bond percolation threshold. The radiation sensitivity of these plasma-arc spray films is concluded to be due to poor intergranular characteristics. This information is being used to modify the processing steps to improve the properties of films produced by this technique. In contrast, high energy H and He ion irradiation of the laser evaporated films resulted in a negligible change in the resistance- temperature behavior. The low energy B and N ion irradiation of the laser evaporated films had the effect of a gradual lowering of the completion temperature of the superconducting transition (T sub C - completion). The gradual lowering of T sub C - completion with fluence, d (delta T sub c) / d phi, with similar results by other groups. This behavior is interpreted as a progressive decoupling of the grains and extrinsic to that of the bulk YBa2Cu3O(7-delta). (JHD)

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1988
Accession Number
ADA199883

Entities

People

  • Douglas B. Chrisey

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Boundaries
  • Charged Particles
  • Couplings
  • Electrical Conductivity
  • Electron Beams
  • Geometry
  • Grain Boundaries
  • Grain Size
  • High Density
  • High Energy
  • Low Density
  • Particle Bombardment
  • Physical Properties
  • Resistance
  • Superconductivity
  • Thick Films
  • Thin Films

Fields of Study

  • Physics

Readers

  • Nuclear and Radiation Engineering.
  • Plasma Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition