Gas Jet Deposition of Multicomponent Ultrafine Microstructures
Abstract
The potential technological importance of multicomponent ultrafine microstructures makes it essential to develop methods of formation which permit both higher growth rates and improved control over material properties. During the course of our Phase I research effort, we have shown that our new proprietary technique, Gas Jet Deposition , has these capabilities and other advantages over established methods. In this technique, depositing atoms, molecules or clusters are seeded into a free jet which is directed at a substrate at low temperature in a high background pressure. The deposition rates can be exceptionally large; the high pressure, low temperature conditions permit the processing of new types of surfaces; and deposition can occur in a reactive mode for production of oxide and nitride materials. Phase I achievements include: (1) fabrication of uniform 100 layer alternating gold/copper thin film multilayer microstructures with 5 nm individual layer thickness; (2) fabrication of 3 nm gold particles; (3) deposition of copper oxide, gold oxide, silicon oxide and silicon nitride thin films. These results were confirmed using stylus profilometry, low angle x-ray diffraction, auger depth profiling, and transmission electron microscopy.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 28, 1988
- Accession Number
- ADA200101
Entities
People
- Bret L. Halpern
- Jerome J. Schmitt