In-Situ Surface during Laser-Controlled Chemical Processing of Surfaces

Abstract

Experiments designed to assess the utility of several methods of surface analysis under reaction conditions are described. The goal of the research was to develop new methods with which to understand the mechanisms associated with the preparation of materials of electronic interest by chemical vapor deposition, with an emphasis on laser control of the reactions. The focus of the work was improve the sensitivity of unenhanced surface Raman spectroscopy through the combined use of ultraviolet lasers, Cassegrain optical systems and charge-coupled device detectors. Model systems to test these technical improvements were designed and an understanding of the factors that govern sensitivity has been achieved. Construction of a system for laser direct writing as well as the installation of a multipurpose surface analysis system are also described.

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Document Details

Document Type
Technical Report
Publication Date
Jun 20, 1988
Accession Number
ADA200206

Entities

People

  • Alan Campion

Organizations

  • University of Texas at Austin

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Charge Coupled Devices
  • Chemical Vapor Deposition
  • Detectors
  • Lasers
  • Mass Spectrometry
  • Materials
  • Optics
  • Quantum Yields
  • Radiation
  • Raman Spectroscopy
  • Scattering
  • Spectra
  • Spectrometry
  • Spectroscopy
  • Surface Analysis
  • Ultraviolet Lasers
  • Vapor Deposition

Fields of Study

  • Physics

Readers

  • Optical Physics and Photonics.
  • Systems Analysis and Design
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene