Proposal to Study the Interaction of Polyimide Precursors and Thin Polyimide Films with Silicon and Silicon Oxide Surfaces

Abstract

The work performed within the research contract N00014-85-K-0641 produced results, which for the first time allowed us to derive a model for the detailed molecular mechanism of adhesion between a polymer and a metal surface. The spectroscopic characterization of polyimide/metal interface was made possible by a vapor deposition technique used to produce polyimide films sufficiently thin to access the interface by photoelectron spectroscopy and Infrared Reflection Absorption Spectroscopy. The polyimide films were prepared by codeposition of oxidianiline (ODA) and 1,2,4,5 Benzenetetracarboxylic Anhydride (PMDA) onto a surface held at 300 K to form polyamic acid. Thin films. (jes)

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1988
Accession Number
ADA201183

Entities

People

  • Michael Grunze

Organizations

  • University of Maine

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Absorption
  • Adhesion
  • Anhydrides
  • Chemical Cleaning
  • Chemistry
  • Contracts
  • Critical Temperature
  • Films
  • Materials
  • Materials Science
  • Photoelectrons
  • Precursors
  • Pressure Measurement
  • Reflection
  • Spectroscopy
  • Universities
  • Vapor Deposition

Readers

  • Polymer Science and Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene