Wavelength Independent Optical Microscopy and Lithography

Abstract

At the start of the present contract we had only a rudimentary understanding of the nature of the near-field. As a result of this contract, great progress has been made both in building a theoretical foundation and underpinning this foundation with crucial experiments. The fundamental principle underlying the NSOM concept is outlined in Figure 1, where visible light is depicted as being normally incident on a conducting screen containing a small (sub-wavelength) aperture. Because the screen is completely opaque, the radiation emanating through the aperture and into the region beyond the screen is first collimated to the aperture size rather than to the wavelength of the radiation employed.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Oct 31, 1987
Accession Number
ADA201442

Entities

People

  • Adrian S. Lewis
  • M. Isaacson

Organizations

  • Cornell University School of Applied and Engineering Physics

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Accuracy
  • Air Force
  • Ceramic Materials
  • Detectors
  • Electromagnetic Fields
  • Electron Beam Lithography
  • Electron Beams
  • Electron Microscopy
  • Fabrication
  • Far Field
  • High Resolution
  • Light Sources
  • Lithography
  • Manufacturing
  • Materials
  • Optics
  • Two Dimensional

Fields of Study

  • Physics

Readers

  • Electromagnetic Wave Scattering and Antenna Radiation Engineering
  • Nanoscale Plasmonic Nanotechnology
  • Theoretical Analysis.