Poly(aryline imides) as E-Beam Resist: Sensitivity and Resolution

Abstract

Polyamic acids synthesized for di-trifluoromethyl methan bis(phthalic anhydride) and 4,4'-diaminophyenyl sulfone (F-1) and 4,4'-diaminophenyl ether (F-4) were found to have excellent negative E beam resist properties. The best materials contain about 90% imidized structural units having sensitivities of 1. 5 to 2.5 micro/aq. cm. and contrast of 1.0 to 1.3. Polyamic acid of pyromellitic dianhydride and 4,4'-diaminophenyl sulfone (P-1) imidized to 97% exhibits useful positive E-beam resist properties. Radiation induces imidization and chain scission to alter the solubility of the resist polymers resulting in the formation of latent images. Imides, Aryl radicals.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1987
Accession Number
ADA201739

Entities

People

  • B. M. Gong
  • James C. Chien

Organizations

  • University of Massachusetts Amherst

Tags

DTIC Thesaurus Topics

  • Anhydrides
  • Copolymers
  • Dose Rate
  • Electron Beam Lithography
  • Electron Beams
  • Electron Microscopes
  • High Resolution
  • Infrared Spectra
  • Lithography
  • Materials
  • Microscopy
  • Military Research
  • Polymers
  • Propanols
  • Radiation
  • Scanning Electron Microscopes
  • Sensitivity

Readers

  • Nanofabrication and Microfabrication.
  • Organic Chemistry
  • Polymer Science and Engineering.