The Preparation of ACEL Thin Films

Abstract

Details are presented for the chemical vapour deposition of thin films for ACTFEL devices. An aerosol spray pyrolysis process is described for the deposition of insulating oxide layer, Zirconium dioxide, Aluminium oxides, Lead Titanate's, from acetylacetonate solutions, alkoxides and substituted alkanoates. The general applicability of this process to other oxide layers is clearly demonstrated. The deposition of the active ZnS. Mn layer by atmospheric and low pressure chemical vapour deposition is reported. Zinc diethyl dithiocarbamate, (Zn((C2H3)2NCS2)2 has been used in both processes. This work has led to the development of the first reported all CVD ACTFEL device structure.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1988
Accession Number
ADA201813

Entities

People

  • A. Saunders

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aluminum
  • Aluminum Oxides
  • Barometric Pressure
  • Base Pressure
  • Films
  • Flow Rate
  • Gas Flow
  • Graphitic Materials
  • Lead Titanates
  • Liquids
  • Materials
  • Mixtures
  • Oxides
  • Piezoelectric Crystals
  • Stainless Steel
  • Thin Films
  • Zirconium

Fields of Study

  • Materials science

Readers

  • Organic Chemistry
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene