Microstructure of Thin Films

Abstract

The techniques of determination of refractive indices in air are presented. In Tucson, the surface plasmon resonance method is used for the study of silver layers produced by different techniques. In Marseille, the guided wave technique is used for the determination of anisotropy and indices of several dielectric materials. The problem of the uniformity of the thickness and of the index of a layer deposited on a large surface is especially analyzed in the case of the Ion Assisted deposition technique. An overview of the last results obtained in Maseille and concerning the study of the scattering is given. The theoretical development performed for the interpretation of the scattering diagram leads to information concerning the grain size of the materials. The theoretical atomistic modelling of the growth process pursued in TUcson would be a complementary tool to help in the understanding of microstructure of deposited films. A survey of the results concerning OSA titania films study obtained in Marseille is given. Keywords: Optical Surface measurements, Optical anisotropy, Optical surface scattering, Optical coatings, Thin film measurements, Optical constants, Titanium oxides, Lanthanum fluoride, ALuminum.

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Document Details

Document Type
Technical Report
Publication Date
Sep 15, 1988
Accession Number
ADA201987

Entities

People

  • H. A. Macleod

Organizations

  • University of Arizona

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Crystal Structure
  • Dielectrics
  • Diffraction
  • Light Scattering
  • Materials Laboratories
  • Materials Processing
  • Materials Science
  • Optical Materials
  • Optical Properties
  • Optics
  • Refractive Index
  • Resonance
  • Scattering
  • Spectra
  • Surface Plasmon Resonance
  • Titanium
  • X-Ray Diffraction

Fields of Study

  • Physics

Readers

  • Thin Film Deposition Science.