Excimer Projection Lithography at 193-nm Wavelength

Abstract

Excimer laser projection lithography is expected to become a widely used technique, capable of high throughputs at resolution well below 0.5 micrometers. In this paper we demonstrate excimer projection patterning with 0. 13 micrometers resolution, and we address issues related to laser engineering and optical materials, which are encountered in the design of practical excimer projection systems. Reprint.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1988
Accession Number
ADA201988

Entities

People

  • D. J. Ehrlich
  • M. Rothschild

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Absorption
  • Absorption Coefficients
  • Air Force
  • Color Centers
  • Engineering
  • Excimer Lasers
  • Fluorides
  • High Resolution
  • Laser Pulses
  • Lasers
  • Lithography
  • Materials
  • Numerical Aperture
  • Optical Materials
  • Photolithography
  • Point Defects
  • Throughput

Fields of Study

  • Physics

Readers

  • Molecular Photonics/Laser Physics
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Systems Analysis and Design

Technology Areas

  • Directed Energy