Environmental Effects on the Time Dependent Failure of Non-Oxide Ceramics
Abstract
The mechanical and chemical factors that contribute to time dependent strength changes have been investigated for a variety of non-oxide materials including silicon nitride, silicon carbide and siliconized silicon carbide. The flaw behavior in an as-machined and oxidized HIP'ed silicon nitride under static load was investigated at various stress intensities, times, and temperatures. Flaw origins were of the pore/cavity and iron-based inclusion type. There was no strength increase or degradation in as-machined and oxidized samples static loaded for ten hours at 1100 C in air below the threshold stress intensity. The threshold stress intensity for crack growth at 1100 C were determined to be 1.75 and 2.00 MPa.m1/2 for the as-machined and oxidized HIPSN, respectively. A strength decrease with increased applied stress was observed in as-machined specimens static loaded at 1200 C and 1300 C in air. This effect is due to the creation of a new flaw population with more severe flaws. Keywords: Silicon nitride, Silicon carbide, Oxidation, High temperature strength, Threshold stress intensity, Slow crack growth, Tensile creep behavior, Cavitation, Creep damage.
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 03, 1988
- Accession Number
- ADA202391
Entities
People
- Richard E. Tressler
Organizations
- University of Pennsylvania