Theoretical Studies of Heterogeneous Reactions in Silicon CVD (Silicon Vapor Deposition) Catalysis
Abstract
The results of a theoretical/computational research program to develop new methods and to investigate the chemical dynamics of various elementary homogeneous and heterogeneous processes occurring in the chemical vapor deposition of silicon form silane are described. The types of elementary processes we have studied include: Unimolecular dissociation of isolated gas- phase molecules and radicals, silicon clustering, gas-surface scattering, chemisorption, processes, diffusion on silicon surfaces, bimolecular gas-phase reactions, and tunneling in H-atom diffusion on silicon surfaces. Much of the research was done using standard classical trajectory methods. Monte Carlo variational phase-space and transition-state theories, which were developed in this research program were used to study processes that occur on long timescales. Silicon, Chemical vapor deposition, Silane solar cells.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 25, 1988
- Accession Number
- ADA202905
Entities
People
- Donald L. Thompson
- Lionel M. Raff
Organizations
- Oklahoma State University–Stillwater