Laser-Induced Metal Deposition on Semiconductors from Liquid Electrolytes

Abstract

Maskless deposition of gold and copper from electrolyte solutions onto n-doped semiconductors (GaAs, Si) is investigated. The metal deposits are found to have lateral dimensions of about 1 micro and are in barrier contact with the semiconductor. The proposed deposition mechanism is governed by the electric fields resulting from the Dember effect, the p-n junction and the thermal emf. Maskless Deposition, Laser induced, Metal, Semiconductors, Liquid electrolytes, Micron lateral dimensions, Dember effect, Gallium arsenides silicon.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1988
Accession Number
ADA203612

Entities

People

  • B. S. Luk'yanchuk
  • Daniel A. Jelski
  • F. V. Bunkin
  • G. A. Shafeev
  • I. Hevesi
  • L. Nanai
  • M. R. Brook
  • Thomas F. George
  • Z. C. Wu

Organizations

  • University at Buffalo

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Abstracts
  • Air Force
  • Chemical Compounds
  • Chemical Engineering
  • Chemistry
  • Electric Fields
  • Electrolytes
  • Materials
  • Materials Science
  • Military Research
  • New York
  • P-N Junctions
  • Physics
  • Semiconductors
  • Solid State Physics
  • Surface Chemistry
  • United States

Fields of Study

  • Materials science

Readers

  • Battery Technology and Engineering
  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene