X-ray Diffraction Study of Phase Formation and Growth in Nitrogen Implanted Iron: Temperature Effects

Abstract

We report preliminary results from an ongoing study of iron nitride grains formed in high purity iron under nitrogen ion bombardment. Under various implantation conditions, different iron nitride phases grow large enough to produce sharp x-ray diffraction lines. We have used these lines to examine the influence of target temperature during implantation. Between 200 C and 400 C increasing target temperature, which enhances dopant mobility, reduces the retained dose of nitrogen and restricts the formation of nitride phases. Over this temperature range, however, increasing vacancy mobility favors the growth of nitride grains and x-ray line breadth data suggests an optimum temperature for growth of Fe4N grains. Keywords: Ion implantation, Nitrogen implantation, Iron nitride, X-ray diffraction.

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Document Details

Document Type
Technical Report
Publication Date
Nov 01, 1988
Accession Number
ADA203625

Entities

People

  • David R. Chipman
  • Forrest C. Burns
  • Louis G. Carreiro
  • Ronald J. Arnott
  • William J. Croft

Tags

Communities of Interest

  • Advanced Electronics
  • Space
  • Weapons Technologies

DTIC Thesaurus Topics

  • Air Force
  • Corporations
  • Diffraction
  • Electron Microscopes
  • Elements
  • Engineering
  • Implantation
  • Information Processing
  • Ion Beams
  • Ion Implantation
  • Ions
  • Materials
  • Materials Science
  • Military Research
  • Scanning Electron Microscopes
  • X Rays
  • X-Ray Diffraction

Readers

  • Materials Science and Engineering.
  • Semiconductor Device Technology
  • Systems Analysis and Design