Establishment of an Electron Beam Lithography Facility
Abstract
Enclosed is a final report on testing of an electron beam writer. This electron beam writer will be used to produce high resolution, large space bandwidth product holographic optical elements (which are versatile, passive components of opto-electronic systems), to fabricate fast, compact, active opto-electronic devices and to make masks for high speed millimeter wave devices or high frequency integrated circuits, as described in the original proposal.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 13, 1989
- Accession Number
- ADA206215
Entities
People
- Sing H. Lee
Organizations
- University of California, San Diego