Thin Refractory Films on Fused Silica Crucibles
Abstract
The ability to control unwanted impurity levels during electronic device fabrication is essential to establishing the desired properties and quality for device reliability. Conventional production processes must be painstakingly monitored to ensure against contamination, and are vulnerable to the introduction of impurities at many stages. One source of impurities is the containment vessel for the melt. In this program, Ultramet demonstrated the feasibility of fabricating inexpensive, high-purity crucibles by an innovative application of chemical vapor deposition (CVD), which typically produces materials with impurity levels of 5 ppm. By depositing thins, pore-free refractory films on the interior surfaces of fused silica crucibles, contamination protection equal to or better than that of expensive monolithic freestanding crucibles can be provided. Thin refractory films, Ultrahigh purity, Crucibles, Chemical vapor deposition.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1988
- Accession Number
- ADA206909
Entities
People
- J. G. Sheek
- Richard B. Kaplan