An X-Ray Source for Lithography Based on a Quasi-Optical Maser Undulator
Abstract
The use of electromagnetic waves is proposed as an undulator in order to generate x-rays in the wavelength range required for fabrication of integrated circuits. The configuration consists of a quasi optical maser cavity through which a beam of relativistic electrons is made to propagate, spontaneously emitting x-rays of the desired energy. For 5'' silicon wafers covered with a sensitive resist such as PBS, this translates into a throughput of 26 wafers/hr using an aggressive stepper. The scaling of x-ray power with wavelength indicates that the throughput can be increased substantially using resist which are sensitive to shorter wavelength x-rays.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 09, 1989
- Accession Number
- ADA208522
Entities
People
- Bahman Hafizi
- F. Mako
- Phillip A. Sprangle
Organizations
- United States Naval Research Laboratory