Custom Diffraction Gratings

Abstract

The objective of this work was to design, develop and manufacture a batch of custom transmission diffraction gratings with a low zero-order optical transmission across the visible and near-infrared waveband. A high laser damage threshold was also desirable. It was shown that neither conventional blazed gratings nor holographically fabricated sinusoidal photoresist gratings were entirely suitable. The preferred approach was to use reactive ion etching to transfer a quasi-sinusoidal groove profile into the surface of a hard substrate such as fused silica. Differential etch rates were exploited to achieve a larger groove amplitude in the etched gratings than in the photoresist mask. Of the batch of ten grating which was supplied, the best grating exhibited a zero-order transmission which did not exceed 6% over the wavelength range 543nm - 875nm. The main conclusion of the work was that a deep grooved surface relief transmission diffraction grating can provide a broad band optical attenuation of around 95% across the visible and near infrared waveband. The use of reactive ion etching techniques can enable the production of such gratings with high laser damage thresholds.

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Document Details

Document Type
Technical Report
Publication Date
Jul 07, 1989
Accession Number
ADA211002

Entities

People

  • T. R. Empson

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Coatings
  • Contracts
  • Diameters
  • Diffraction
  • Dry Etching
  • Etching
  • Fabrication
  • Frequency
  • Gratings (Spectra)
  • Ion Beams
  • Laser Damage
  • Manufacturing
  • Materials
  • Measuring Instruments
  • Optical Glass
  • Optical Materials
  • Optics

Fields of Study

  • Materials science
  • Physics

Readers

  • Optical Physics and Photonics.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy