Low Temperature Formation of Titanium Aluminide Films Using Physical Vapor Deposition

Abstract

The crystallization of the two intermetallic phases, alpha 2 and beta, which form in Ti3Al alloyed with Nb was investigated in films deposited using direct current magnetron sputtering. Phase formation was studied in post- deposition annealed films as well as in films deposited on heated substrates. Analysis was carried out using X-ray diffraction, scanning electron microscopy, and scanning Auger microprobe analyses. The oxygen content of films formed on heated substrates was 6 at. %, which is considerably lower than the 26 at. % oxygen content of post-deposition annealed films. This difference in the oxygen content is postulated to be a result of the microstructural differences in the films. Formation of the intermetallic phases in the films begins at approximately 100 C. Titanium aluminides, Metal matrix composites, Oxygen content, Alloys, Physical vapor deposition, Microstructure.

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Document Details

Document Type
Technical Report
Publication Date
Aug 21, 1989
Accession Number
ADA211877

Entities

People

  • A. Pattnaik
  • D. K. Perkins
  • E. I. Keith
  • W. F. Henshaw

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemistry
  • Classification
  • Crystal Structure
  • Electron Microscopes
  • Electron Microscopy
  • Elements
  • Low Temperature
  • Materials
  • Materials Science
  • Metallurgy
  • Military Research
  • Physical Vapor Deposition
  • Powder Metallurgy
  • Titanium
  • Titanium Aluminide
  • Vapor Deposition
  • X-Ray Diffraction

Fields of Study

  • Materials science

Readers

  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene