Low Temperature Deposition of Diamond Films for Optical Coatings

Abstract

A low temperature (approx. 400 oC) plasma enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (< or = 3000 A) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50-200. The optical transparency of the films is over 60% in the range of 0.6 micrometer wavelength, which is comparable to that of typed lla natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.

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Document Details

Document Type
Technical Report
Publication Date
Oct 18, 1989
Accession Number
ADA214022

Entities

People

  • R. P. Chang
  • T. P. Ong

Organizations

  • Northwestern University

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms
  • Weapons Technologies

DTIC Thesaurus Topics

  • Chemical Vapor Deposition
  • Chemistry
  • Coatings
  • Diffraction
  • Engineering
  • Grain Size
  • Low Temperature
  • Materials
  • Materials Processing
  • Materials Science
  • Measurement
  • Military Research
  • Optical Coatings
  • Physical Properties
  • Roughness
  • Scattering
  • Spectra

Fields of Study

  • Physics

Readers

  • Thin Film Deposition Science.