Surface Intermediates in Thin Film Deposition on Silicon

Abstract

This project examined the fundamental processes of surface reactions using infrared spectroscopy. The novelty of this project was the development of a dynamic infrared spectroscopic technique capable of following reaction dynamics on well defined single crystal surfaces. The dynamic infrared technique was applied to two experiments. The first experiment was used to follow single shot experiments: the technique was used to follow thermally induced reactions using temperature programmed reflection absorption infrared spectroscopy (TPRAIS). The second experiment is to follow dynamics of repetitive processes combining modulated molecular beams with reflection infrared. This has been demonstrated for simple adsorption desorption of CO on Pt; difficulties in achieving proper conditions for film growth have precluded the application to film deposition, but we are continuing to pursue this problem.

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Document Details

Document Type
Technical Report
Publication Date
Aug 28, 1989
Accession Number
ADA216662

Entities

People

  • Jay B. Benziger

Organizations

  • Princeton University

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Absorption
  • Chemical Engineering
  • Chemical Reactions
  • Chemistry
  • Decomposition
  • Dynamics
  • Electron Density
  • Electrons
  • Frequency Shift
  • Infrared Spectroscopy
  • Molecular Beams
  • Physical Chemistry
  • Single Crystals
  • Spectra
  • Spectroscopy
  • Substitution Reactions
  • Surface Reactions

Readers

  • Electrochemical Engineering/ Fuel Cell Technologies
  • Optical Physics and Photonics.
  • Theoretical Analysis.