Metal Coordination Polymers as Potential High-Energy Lithographic Resists

Abstract

Over the past few years we have developed a number of linear coordination polymers which have interesting properties. One type of study has centered on polymers which would provide sensitive lithographic resists based on the fact that the photoelectric effect interacts with nuclei approximately to the fourth power of the atomic number. We have prepared a number of uranyl carboxylate polymers which are very sensitive to gamma and electron beam radiation with G sub s values higher than any currently available resist material (Archer, Hardiman & Lee, 1987). We have extended this work to cobalt and chromium coordination polymers as well. Coordination polymers of other metals are also under development. Keywords: Metal coordination polymers; Cobalt polymers; Positive resists; Lithographic resists; Chromium polymers.

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Document Details

Document Type
Technical Report
Publication Date
May 15, 1989
Accession Number
ADA216668

Entities

People

  • Paul V. West
  • Ronald D. Archer
  • Valentino J. Tramontano
  • Ven O. Ochaya
  • William Cumming

Organizations

  • University of Massachusetts Amherst

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemical Synthesis
  • Chemistry
  • Chlorides
  • Engineering
  • Films
  • High Energy
  • Magnetic Resonance
  • Materials
  • Materials Science
  • Metal Oxide Semiconductors
  • Metals
  • Military Research
  • Molecular Weight
  • Nuclear Magnetic Resonance
  • Spectra
  • Spectroscopy
  • Spin Resonance

Readers

  • Nuclear and Radiation Engineering.
  • Polymer Science and Engineering.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Microelectronics