Metallaboranes as Precursors to Metallic Glasses

Abstract

Metal organic chemical vapor deposition (MOCVD) is a well established, practical technique for forming simple as well as complex solid state films. Metal-rich metallaboranes constitute practical, low temperature precursors for the vapor deposition of pure, amorphous alloy thin films. This has been demonstrated for the compositions Fe4B and Fe3B. Further, the same approach permits the deposition of refractory borides, e.g., MnB4, under mild conditions. Reaction observed during deposition suggests a route to ternary films of precise composition. The results also suggest that main group transition element clusters in general constitute sources of solid state materials with composition fixed by the precursor. (AW)

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Document Details

Document Type
Technical Report
Publication Date
Dec 09, 1989
Accession Number
ADA216946

Entities

People

  • Thomas P. Fehlner

Organizations

  • University of Notre Dame

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Base Pressure
  • Chemical Vapor Deposition
  • Chemistry
  • Elements
  • Films
  • Low Temperature
  • Materials
  • Materials Processing
  • Metals
  • Military Research
  • Precursors
  • Scientists
  • Security
  • Thin Films
  • Transition Metals
  • Transitions
  • Vapor Deposition

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Quantum Chemistry
  • Thin Film Deposition Science.