Chemical Beam Epitaxy of ZnSe

Abstract

The objective of the program is to determine optimum growth parameters for the chemical beam epitaxial of ZnSe. In addition microstructural, optical, and electrical characterization of the material will be performed to assess the material's quality and potential; comparisons will be made with material grown by molecular beam epitaxy. (RRH)

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jan 31, 1990
Accession Number
ADA217375

Entities

People

  • Leslie A. Kolodziejski

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics
  • Autonomy

DTIC Thesaurus Topics

  • Barometric Pressure
  • Computers
  • Diffusion Pumps
  • Electrical Engineering
  • Engineering
  • Engineers
  • Epitaxial Growth
  • Flow
  • High Temperature
  • Hypervelocity Flow
  • Mass Flow
  • Massachusetts
  • Materials
  • Military Research
  • Molecular Beam Epitaxy
  • Pneumatic Valves
  • Pumps

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Thin Film Deposition Science.