Growth and Characterization of Gallium (III) Oxide Films

Abstract

A simple spray pyrolysis technique has been applied to the formation of dense, homogeneous gallium(III) oxide thin films on both silicon and silica substrates. The high quality of these films has been established by transmission electron microscopy, x-ray diffraction, optical spectra, and current-voltage measurements. Keywords: Gallium compounds; Thin films.

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Document Details

Document Type
Technical Report
Publication Date
Jan 15, 1990
Accession Number
ADA217568

Entities

People

  • Aaron Wold
  • Kirby Dwight
  • P. Wu
  • Robert N. Kershaw
  • Y-m. Gao

Organizations

  • Brown University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Atomization
  • Band Gaps
  • Chemical Synthesis
  • Chemical Vapor Deposition
  • Chemistry
  • Diffraction
  • Electron Microscopes
  • Electron Microscopy
  • Energy Bands
  • Films
  • Materials
  • Measurement
  • Oxide Films
  • Spectra
  • Vapor Phases
  • X Rays
  • X-Ray Diffraction

Readers

  • Organic Chemistry
  • Semiconductor Device Technology
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene