Modified Maleic Anhydride Copolymers as E-Beam Resists

Abstract

Copolymers of maleic anhydride with styrene, ethylene, and methyl vinyl ether were modified and evaluated for use as negative working resist materials in electron beam lithography. The copolymers used were modified by reaction with an organometallic compound, which resulted in incorporation of tin in the pendant chains of the copolymers. The polymers were blended with a reactive plasticizer, dipentaerythritol pentaacrylate (DPEPA), to enhance sensitivity and to improve resolution. Incorporation of tin into the copolymer resulted in increased sensitivity to the electron beam, improved dimensional stability, and increased oxygen reactive ion resistance. Tin modified polymers blended with DPEPA yielded sensitivities in the range of 0.2 to 1.5 micro(C)/sq. cm.

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Document Details

Document Type
Technical Report
Publication Date
Feb 15, 1990
Accession Number
ADA218470

Entities

People

  • B. C. Dems
  • F. Rodriquez
  • S. K. Obendorf
  • S. Malhotra
  • Y. M. Namaste

Organizations

  • Cornell University School of Chemical and Biomolecular Engineering

Tags

Communities of Interest

  • Ground and Sea Platforms

DTIC Thesaurus Topics

  • Alkenes
  • Anhydrides
  • Chemical Synthesis
  • Chemistry
  • Copolymers
  • Electron Beam Lithography
  • Electron Beams
  • Ethylenes
  • Glass Transition Temperature
  • Liquid Chromatography
  • Lithography
  • Materials
  • Organic Chemistry
  • Polymeric Films
  • Polymers
  • Radiation
  • Transition Temperature

Readers

  • Nanofabrication and Microfabrication.
  • Polymer Science and Technology

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene