Theoretical Studies of Photochemical Methods for Semiconductor Etching
Abstract
The general theme of the project is the use of photochemical methods for etching semiconductor surfaces or depositing metals on them. There are two aspects to this work: (a) the photochemical process by which the desired molecular or atomic fragments are deposited on the surfaces and (b) the fate of the atoms once deposited (e.g. motion of the atoms on the surface, island growth, sticking probabilities, etc.) (RRH)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1990
- Accession Number
- ADA218475
Entities
People
- Horia Metiu
Organizations
- University of California, Santa Barbara