Microstructure of Thin Films
Abstract
Much work is devoted to the study of Ion Assisted Deposition (IAD) with different materials: metals, (aluminum, silver) and dielectrics, nitrides, fluorides and oxides. Concerning oxides, a comparison between IAD and ion plating techniques is in progress. For the characterization, we describe two techniques used for determination of optical losses which are photothermal deflection and measurements of angular scattering distribution. Concerning photothermal deflection, the results of characterization obtained on samples of TiO2 are given; instabilities versus time are observed when the samples are illuminated. The theory and experiments performed on scattering are applied to coatings of special designs produced by Balzers, OCLI, OJAI and Spectra Physics to determine the correlation between interfaces of the multilayers. These results, presented at the OSA 1989 meeting are summarized. This work leads indirectly to the measurement of the grain size of the materials in thin film form. A completely different approach is given by growth modeling, but it remains to link the two techniques for a better understanding of the process of growth. Keywords: Metal films; Optical surface scattering; Optical constants for titanium dioxide; Tantalum oxide; Lanthanum fluoride; Optical coatings/surface measurements; Infrared optical materials; Trifluorides. France.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 07, 1990
- Accession Number
- ADA219262
Entities
People
- C. Amra
- Emile Pelletier
- H. A. Macleod