Soluble Polysilanes: A New Class of Radiation Sensitive O2-Rie Resistant Polymers for Use in Microlithography

Abstract

This report describes the progress in the synthesis, characterization and spectroscopy of soluble polysilanes and germanes. It includes polymer structural studies, theoretical investigations of electronic structure and mechanistic studies of the photodecomposition. It also describes the potential of these materials as polymeric photoconductors, and as new materials for microlithography. The initial work on the nonlinear optical characteristics of these materials is also included. (sdw)

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Document Details

Document Type
Technical Report
Publication Date
Mar 12, 1990
Accession Number
ADA219476

Entities

People

  • R. D. Miller

Organizations

  • International Business Machines Corporation (Armonk, NY)

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemistry
  • Diffraction
  • Excimer Lasers
  • High Resolution
  • Ionizing Radiation
  • Long Wavelengths
  • Low Temperature
  • Macromolecules
  • Mass Spectrometry
  • Microlithography
  • Optical Properties
  • Polymers
  • Quantum Yields
  • Scattering
  • Spectra
  • Spectroscopy
  • Transition Temperature

Readers

  • Business Analytics
  • Materials Science and Engineering.
  • Polymer Science and Technology

Technology Areas

  • Microelectronics