Reactions of Silane in Active Nitrogen
Abstract
Silane is used in the production of amorphous silicon and thin films of silicon nitride. In the production of the latter, silane is mixed with either ammonia or nitrogen in a low pressure electric discharge, and a thin film of silicon nitride is formed at the boundaries of the discharge. Besides the chemical reactions which are driven directly by electrons in the discharge, a number of reactions are believed to occur among chemically reactive, neutral species. These reactions can have a significant effect on the silane dissociation which occurs in these discharges. To study this neutral chemistry, an experimental program along with a coupled rate equation modeling effort was undertaken of the reactions of silane in discharge-produced 'active nitrogen'. Measurements of silane dissociation produced by 'active nitrogen', spectra of the chemiluminescence produced in the reaction, and a rate equation model developed to describe the results are presented. Active nitrogen; Silicon nitride; Nitrogen afterglow; Silanes; SiH(4); Solar cells; Xerographic photoreceptors; Images; Detectors; Microelectronic devices; PECVD; Plasma enhanced chemical vapor deposition; Ammonia; Dissociation; Emission spectra.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 29, 1990
- Accession Number
- ADA220371
Entities
People
- Charles A. Dejoseph Jr.
Organizations
- Wright Laboratory