Studies of Chemistry and Diffusion on Silicon and Gallium Arsenide Surfaces Using Laser-Induced Thermal Desorption

Abstract

Surface chemistry and surface diffusion play pivotal roles in semiconductor processing and must be understood as electronic device dimensions approach the submicron level. In this project, basic time-dependent processes on silicon surfaces were examined using laser induced thermal desorption (LITD) and Fourier transform infrared (FTIR) spectroscopy. These techniques provided direct, quantitative measurements of surface coverage in real-time. Using LITD and FTIR techniques, emphasis was on a microscopic understanding of semiconductor surface reaction kinetics.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1990
Accession Number
ADA220946

Entities

People

  • Steven M. George

Organizations

  • Stanford University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Kinetics
  • Chemical Reactions
  • Chemistry
  • Electronic Materials
  • Electronics
  • Films
  • Kinetics
  • Linear Accelerators
  • Materials
  • Materials Laboratories
  • Materials Processing
  • Materials Science
  • New Hampshire
  • Semiconductors
  • Surface Chemistry
  • Surface Reactions
  • Thin Films

Fields of Study

  • Materials science

Readers

  • Electrochemical Engineering/ Fuel Cell Technologies
  • Integrated Circuit Design and Technology.
  • Theoretical Analysis.

Technology Areas

  • Directed Energy
  • Microelectronics