Research on Sputtering of Ferroelectric Thin Films

Abstract

The magnetron sputtering technique has been used to grow morphotropic phase boundary ferroelectric thin films of tungsten bronze PBN:60 and pervoskite PLZT. Film crystallinity was found to be strongly influenced by substrate temperature, with temperatures of 500-600 C usually required. Single crystal PBN:60 films were grown on SBN:60 substrates, whereas grain-oriented films were achieved on (100)-oriented Si substrates. PLZT films are grain-oriented for (001)-oriented SBN and have excellent surface quality for guided wave applications. This is the first time such films have been grown on tungsten bronze substrates. Both PBN:60 and PLZT films present a great promise for SLM and electronic memory applications. (rh)

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1990
Accession Number
ADA221792

Entities

People

  • R. R. Neurgaonkar

Tags

DTIC Thesaurus Topics

  • Crystal Lattices
  • Crystal Structure
  • Crystals
  • Dielectric Permittivity
  • Diffraction
  • Films
  • Materials
  • Optical Modulators
  • Optical Waveguides
  • Optoelectronic Devices
  • Perovskites
  • Phase Diagrams
  • Phase Transformations
  • Solid Solutions
  • Thin Films
  • Transition Temperature
  • Transitions

Fields of Study

  • Materials science

Readers

  • Optical Physics and Photonics.
  • Superconducting Magnet Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene