Laser Induced Surface Chemical Epitaxy

Abstract

Studies of the thermal and photon-induced surface chemistry of dimethyl cadmium (DMCd) and dimethyl tellurium (DMTe) on GaAs(100) substrates under ultrahigh vacuum conditions have been performed for substrate temperatures in the range of 123 K to 473 K. Results indicate that extremely efficient conversion of admixtures of DMTe and DMCd to CdTe can be obtained using low power 193 nanometers laser pulses at substrate temperatures of 123 K. Subsequent annealing at 473 K produces an epitaxial film. Given the similar electronic structure of other II-VI metal alkyls, such as dimethyl mercury, zinc, and selenium, it is believed that laser induced surface chemical epitaxy is suitable for producing patterned deposits of II-VI quantum well structures. Keywords: II- VI epitaxy, Laser induced chemistry, Deposition, Thin film, Vapor deposition, LCVD, MOMBE, Metalorganic molecular beam epitaxy.

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Document Details

Document Type
Technical Report
Publication Date
Mar 01, 1990
Accession Number
ADA222082

Entities

People

  • Andrew Freedman
  • Charter D. Stinespring

Organizations

  • Aerodyne Research

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemical Analysis
  • Chemical Reactions
  • Chemical Synthesis
  • Chemical Vapor Deposition
  • Chemistry
  • Compound Semiconductors
  • Materials
  • Materials Science
  • Molecular Beam Epitaxy
  • Silicon Carbide
  • Solid State Physics
  • Spectra
  • Spectroscopy
  • Surface Chemistry
  • Surface Reactions
  • Thin Films
  • X Rays

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene
  • Quantum Computing