Diffusion of Small Molecules in Radiation Damaged PMMA Thin Films
Abstract
Ultraviolet irradiation of poly(methylmethacrylate), PMMA, creates radicals which can initiate polymerization of acrylic acid to form block and/or graft copolymer with solubility different from that of PMMA. Selective development of modified PMMA produces negative tone images. The detailed lithographic aspects of this process were investigated in our laboratory. To study further the radiation-induced acrylic acid modification of PMMA, a quartz crystal microbalance was constructed in the reaction chamber and the weight change of PMMA films coated on the quartz crystal was directly monitored during the modification process. The weight of incorporated acrylic acid at a certain reaction time was proportional to the incident dose. With higher dose the increase in weight accelerated as the reaction proceeded. Several solvents of similar boiling points but different solubility parameters were studied in the same way and it was found that those which has solubility parameters similar to PMMA exhibited enhanced diffusion rates after the polymer film had been irradiated. These results suggest that the relaxation of PMMA chains is facilitated by increased free volume in the irradiated polymer film, when the polymer chains respond to swelling stress. Keywords: Polymers, PMMA, Positive resists, Radiation, Chain scission, Decrease in molecular weight, Solubility, Free radicals, Acrylic acid, Quartz crystal microbalance, Solvents.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 31, 1990
- Accession Number
- ADA222256
Entities
People
- J. A. Moore
- Sang Y. Kim
Organizations
- Rensselaer Polytechnic Institute