"Influence of Stereochemistry on Radiation-Induced Structural Changes in PMMA"
Abstract
We have been studying the effects of radiation on poly(methylmethacrylate), PMMA, which has been used as a resist in computer chip microlithography. In contrast to predictions based on solution photochemistry of related compounds we have found by careful spectroscopic study of the irradiation polymer leads to four different kinds of double bonds. These ester cleavage reactions do not necessarily lead to rupture of the backbone, a necessary condition for efficient use as a resist. We find evidence that not only does the state (solution vs. film) upon which irradiation is carried out affect the product distribution, but also that the stereochemistry of PMMA (atactic vs. isotactic) plays a role.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 31, 1990
- Accession Number
- ADA222257
Entities
People
- J. A. Moore
- Jin O. Choi
Organizations
- Rensselaer Polytechnic Institute