Polar Coordinate Laser Writer for Binary Optics Fabrication
Abstract
A Laser Writer system for recording centro-symmetric patterns in photoresist has been developed as an alternative method for binary optics mask and component fabrication. This system is capable of generating binary amplitude patterns with linewidths below 1 micron and with a positional accuracy of less than 0.1 micron on up to 3 in. diameter planar substrates. The measured wavefront error and diffraction efficiency of a direct-write two-phase-level F/ 10 lens confirm that high quality components can be fabricated quickly, easily, and at low cost. (RH)
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1990
- Accession Number
- ADA222827
Entities
People
- Sharlene Liu
- William L. Goltsos
Organizations
- Massachusetts Institute of Technology