High Current Metal Ion Implantation
Abstract
This report summarizes the research and development that has been carried out at Lawrence Berkeley Laboratory to develop a novel kind of high current metal ion source for metallurgical surface modification application. In ion implantation, an energetic ion beam is injected into a solid surface with the result that the surface composition is changed. For the case when the surface is a metal, the tribological properties of the new metallurgical surface can be significantly improved over the unimplanted surface. Previously, however, very intense metal ion beams have not been available, and this has been an impedance to the development of the field. With the MEVVA (Metal Vapor Vacuum Arc) ion source, metal ion beam currents of very high intensity have become available. In this report we outline the progress made under the funded program in the four areas addressed: development of the MEVVA ion source for ion implantation application; research on the ion beam characteristics and behavior; development of our ion implantation facility; metallurgical ion implantation research that we have carried out.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 20, 1990
- Accession Number
- ADA223098
Entities
People
- Ian G. Brown
Organizations
- University of California, Berkeley