A Cryocooler for High Acceleration Applications
Abstract
Repairs to the sputtering system have been completed and the system is operable. The replaced oscillator tube delivers significantly more power than the previous tube, which is normally advantageous due to higher sputtering rates. However, in our particular application, this increased power is resulting in dissociation of the oxide which are to be sputtered. Optimization of the sputtering conditions to obtain the required oxide film is currently underway.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 25, 1990
- Accession Number
- ADA223618
Entities
People
- Michael J. Nilles