Ammonia Chemisorption Studies on Silicon Cluster Ions

Abstract

Silicon clusters in the size range from 5 to 66 atoms were generated by laser vaporization in a supersonic nozzle and injected into the ion trap of a specially-designed Fourier transform ion cyclotron resonance apparatus. On the positively charged clusters ammonia chemisorption reaction rates were found to vary by over three orders of magnitude as a function of cluster size, with clusters of 21, 25, 33, 39, and 45 atoms being particularly unreactive, and cluster 43 being the most reactive. For the negative cluster ions, 43 was the only cluster found to react substantially. Although the reaction behaviour of many clusters clearly indicated that several structural isomers were present with different reaction rates, the strikingly low net reactivity of such clusters as 39 and 45 provides evidence that they have effectively crystallized into a single specially stable form. Keywords: Surface chemistry; Ammonia chemisorption; Silicon cluster ions.

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Document Details

Document Type
Technical Report
Publication Date
Jul 23, 1990
Accession Number
ADA224949

Entities

People

  • J. M. Alford
  • R. E. Smalley
  • R. T. Laaksonen

Organizations

  • Rice University

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemisorption
  • Chemistry
  • Cyclotron Resonance
  • Cyclotrons
  • Diagrams
  • Electronics
  • Equations
  • Frequency
  • Mass Spectra
  • Military Research
  • Molecules
  • Phase
  • Power Spectra
  • Structural Isomers
  • Surface Chemistry
  • United States
  • Waveform Generators

Readers

  • Electrochemical Engineering/ Fuel Cell Technologies
  • Molecular Photonics/Laser Physics
  • Quantum Chemistry

Technology Areas

  • Directed Energy
  • Hypersonics
  • Hypersonics - Hypersonic Flight