Interfacial Chemistry of Titanium Films Deposited on PMDA-ODA Polyimide

Abstract

Titanium was evaporated onto PMDA-ODA polyimide surfaces at room temperature up to total thickness of about five monolayers. The polyimide backbone is ruptured at both the oxygen ether linkage in the ODA and at the nitrogen imide linkage. The first fraction of a monolayer reacts with oxygen atoms in both the carbonyl and ether functionalities and forms a mixed oxide with titanium predominately in the Ti+3 oxidation state. Near one monolayer coverage, a carbide or mixed oxy-carbide species forms. Above one monolayer, nitrogen is strongly attacked and about fifty percent of the nitrogen reacts with titanium. The deposited titanium begins to take on metallic character only after the coverage has reached several monolayers. Keywords: Polyimide, polymer-metal, Interface, Adhesion, X-ray Photoelectron spectroscopy, Scanning tunneling microscopy.

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Document Details

Document Type
Technical Report
Publication Date
Aug 15, 1990
Accession Number
ADA225730

Entities

People

  • W. N. Unertl

Organizations

  • University of Maine

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemistry
  • Emission
  • Energy
  • Films
  • High Vacuum
  • Materials
  • Metals
  • Military Research
  • Monomolecular Films
  • Nitrogen
  • Oxidation
  • Oxides
  • Personality
  • Titanium
  • Transition Metals
  • X Ray Photoelectron Spectroscopy
  • X Rays

Readers

  • Polymer Science and Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene