The Growth of Epitaxial GaAs and GaA1As on Silicon Substrates by MOVPE

Abstract

The objectives of the programme were to undertake research into the growth of GaAs and AlGaAs on silicon substrates, to refine deposition techniques, and optimise the electrical, optical, and structural properties of the layers; to prepare GaAs/AlGaAs heterostructures on silicon for opto- electronic and microwave devices; and to explore the monolithic integration of III-V devices on silicon CMOS ICs. We have made substantial achievements within the area of materials growth, resulting in the development of a successful process for the MOVPE growth of GaAs onto silicon excellent device results. In the two sections below, our device and materials growth achievements are outlined.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Mar 01, 1990
Accession Number
ADA225743

Entities

People

  • D. J. Stirland
  • D. J. Warner
  • J. A. Beswick
  • P. Kightley
  • R. R. Bradley

Tags

DTIC Thesaurus Topics

  • Barometric Pressure
  • Cellular Structures
  • Ceramic Materials
  • Crystals
  • Detectors
  • Electron Microscopy
  • Epitaxial Growth
  • Fabrication
  • High Temperature
  • Low Temperature
  • Microscopes
  • Microscopy
  • Optoelectronic Devices
  • Partial Pressure
  • Three Dimensional
  • Transmission Electron Microscopy
  • X-Ray Diffraction

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene