Distortion-Free X-Ray Mask Technology
Abstract
The objective of this research project is to develop a closed-loop, feedback-controlled, robust system for reliably achieving zero stress in tungsten (W) films sputtered onto various x-ray mask shop. Our system for controlling stress in sputtered W films is based on the measurement of resonant frequency. Since resonant frequency depends on both the thickness and the stress of the W films, if the thickness is known, the stress is easily calculated. We have set up an rf sputtering system, a fixture for driving the membrane into oscillation, and optical means of detecting the membrane motion.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 11, 1990
- Accession Number
- ADA226524
Entities
People
- Henry I. Smith
Organizations
- Massachusetts Institute of Technology