Flowing Afterglow Deposition for Indium Phosphide Interfacial Studies

Abstract

Flowing Afterglow Chemical Vapor Deposition (FACVD) is a new materials growth process which has been under development at Wayne State University. The project is still in its early phases, but is promising because of its potential for producing novel kinds of materials suitable for microelectronic and optical applications. (JS)

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Document Details

Document Type
Technical Report
Publication Date
Jan 30, 1986
Accession Number
ADA226672

Entities

People

  • R. Arrathoon

Organizations

  • Wayne State University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Afterglows
  • Chemical Vapor Deposition
  • Classification
  • Engineering
  • High Temperature
  • Image Processing
  • Materials
  • Metastable State
  • Michigan
  • Monitoring
  • Phase
  • Plasma Jets
  • Security
  • Temperature Control
  • Universities
  • Vapor Deposition

Fields of Study

  • Chemistry

Readers

  • Molecular Photonics/Laser Physics
  • Research Science/Academic Research
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene