Photodissociation Near a Rough Metal Surface: Effect of Reaction Fields
Abstract
The modification of the photochemical dissociation rate of molecules in the presence of a rough metal surface is explored. Classical electromagnetic calculations are presented for the photodissociation rate of a point dipole near a rough surface modeled as a hemispheroidal pump on a seim-infinite flat plane. A correction is introduced by accounting for the reaction fields due to the dipole-substrate system radiating photons and coupling to delocalized surface plasmons. The effect of the shape and size of the bump and the separation of the molecule from the bump on the rate of photodissociation of the molecule are studied numerically. Keywords: Photodissociation, Rough metal surface, Reaction fields, Chemical reactions, Surface plasmons, Silver substrate, Surface bump.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 1990
- Accession Number
- ADA227030
Entities
People
- Ashok Puri
- Purna C. Das
- Thomas F. George
Organizations
- University at Buffalo