Pseudomorphic Narrow Gap Materials for High Performance Devices
Abstract
Kink-free AIInAs/GaInAs/InP modulation-doped field effect transistors from materials grown under normal molecular beam epitaxy conditions and high transconductance P-channel GaSb MODFET with very low gate leakage currents for complementary circuit applications have been developed. A hot electron bipolar transistor (Auger transistor) has been studied theoretically to show that a substantial improvement over conventional HBTs due to the reduced base resistance. We have also demonstrated theoretically that dominant Auger process in InGaSb/A1GaSb strained quantum well structures can be suppressed. (TTL)
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 02, 1990
- Accession Number
- ADA228828
Entities
People
- Wen I. Wang
Organizations
- Columbia University