X-Ray Optics Research

Abstract

This report describes the production of x-ray optical elements for several wavelengths by sputtering. It describes the installation of a 'silicon/ metals' molecular beam epitaxy (MBE) apparatus and its use in an extensive study of multilayer mirrors based on molybdenum and silicon. Continuing work on several additional materials is described. Finally, studies of substrate and interfacial roughness, using a scanning tunneling microscope (STM) and a WYKO phase-shifting interferometer, are presented.

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Document Details

Document Type
Technical Report
Publication Date
Sep 20, 1990
Accession Number
ADA228940

Entities

People

  • Charles M. Falco

Organizations

  • University of Arizona

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Contracts
  • Crystal Structure
  • Crystals
  • Diffraction
  • Electron Spectroscopy
  • Epitaxial Growth
  • Fabrication
  • Materials
  • Measurement
  • Microscopes
  • Optics
  • Reflectivity
  • Scattering
  • Soft X Rays
  • X Ray Optics
  • X Rays

Fields of Study

  • Physics

Readers

  • Optical Physics and Photonics.
  • Technical Research and Report Writing.
  • Thin Film Deposition Science.