OH Contamination Flux Estimates.

Abstract

Contamination on a cryogenic mirror is considered from two sources. The first source is the deposition of OH formed by the gas phase reaction of atmospheric atomic oxygen with outgassing H2 coolant. The second source is deposition of OH formed by surface reaction of atomic oxygen and atomic hydrogen from the atmosphere. Variations in atmospheric temperature and direction of the mirror with respect to the ram are evaluated. It is found that deposition due to reaction of outgassing products is likely to be smaller than that resulting from the atmospheric mechanism. Keywords: Contamination, OH Deposition, Mirrors, Optics. (js)

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Document Details

Document Type
Technical Report
Publication Date
Sep 10, 1990
Accession Number
ADA229094

Entities

People

  • James B. Elgin

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Abstracts
  • Air Force
  • Atmospheric Temperature
  • Boundary Layer
  • Chemical Reactions
  • Classification
  • Collisions
  • Contamination
  • Elements
  • Equations
  • Flow
  • Flow Fields
  • Hydrogen
  • Molecules
  • Outgassing
  • Security
  • Surface Reactions

Fields of Study

  • Physics

Readers

  • Combustion and Flow Dynamics.
  • Optical Physics and Photonics.
  • Surface Engineering/Surface Coating Technology.